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IMS Nanofabrication AG (“IMS”) is an Austrian based high-tech company and was founded in Dec 2006 through the merger of the former IMS Nanofabrication GmbH and IMS – Ionen Mikrofabrikations Systeme GmbH.

IMS acts as technology innovator and provider for the nanoworld and develops lithography tools for the semiconductor and nanotech industry, concentrating its main efforts presently on the development of an electron multi-beam Mask Exposure Tool (eMET) for the fabrication of leading-edge complex masks and templates.

Based on its extensive and well protected know how in charged particle systems, IMS offers solutions to directly transfer custom designed patterns to resist or to generate resist-less two and three dimensional surface modifications with features below 20 nanometers.

IMS focuses its efforts on the development and production of key tool components and plans to commercialize its technology and related services in cooperation with strategic partners.